Technical resource published by Applied Physics Corporation — manufacturing cleanroom and metrology systems since 1992.719-428-4042 · [email protected]
Semiconductor metrology resource

Specify particle wafer standards from the inspection objective backward.

Select calibration and contamination wafers by particle material, size, count, deposition pattern, wafer substrate, inspection platform and traceability requirement.

PSL + silicaParticle-material selection
Calibration + contaminationDifferent metrology objectives
SSIS compatibilityTool-specific requirements
Applied PhysicsManufacturer-backed technical support
Metrology objective

Calibration standards and contamination standards are not interchangeable

A calibration wafer is designed to establish or verify an inspection response. A contamination standard may be designed to challenge cleaning, handling, detection or process performance. The particle size, count distribution and deposition pattern must match the measurement question.

Specification framework

Build a complete specification

Substrate

Diameter, material, surface condition, notch or flat, film stack and allowable background.

Particles

PSL or silica, nominal sizes, size distribution, concentration, count and traceability.

Deposition

Full deposition, spots, patterned locations, target density and certificate format.

System compatibility

Connect the wafer to the inspection system

Surface-scanning inspection systems differ by optical architecture, sensitivity, wafer handling, supported diameters and calibration procedure. The instrument model and software method should be identified before the wafer is quoted.

Manufacturer connection

Applied Physics manufacturing pathway

Applied Physics manufactures particle and contamination wafer standards and supports PSL and silica applications for semiconductor inspection and metrology. This site provides the technical framework; commercial specifications and quotations are completed through AppliedPhysicsUSA.com.

Frequently asked questions

Practical answers

What information is required for a calibration wafer quote?

Inspection-system model, wafer diameter and substrate, particle material, nominal sizes, deposition pattern or count, certificate requirement, packaging and delivery schedule.

Is NIST traceability the same as NIST certification?

No. Traceability describes an unbroken documented chain of calibrations to stated references with associated uncertainty. It should not be described as blanket NIST certification.

Turn the inspection objective into a complete wafer-standard specification.

Applied Physics can review the inspection platform, wafer substrate, particle material, deposition pattern, traceability and certificate requirements.

Request a technical recommendation